Process of introducing impurity atoms into a semiconductor to modify its electrical properties
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Introducing chemical impurities into a semiconductor; a stage in chip manufacture
Intentional introduction of a selected chemical impurity (dopant) into the crystal structure of a semiconductor to modify its electrical properties For example, adding boron to silicon makes the material more p-type
The deliberate addition of a small amount of an impuritiy in order to changed the properties of the original substance
Adding impurities to a neutral (typically silicon) lattice to bias conduction You might try Britney's guide to Semiconductor Basics : -)
Addition of impurities to a semiconductor or production of a deviation from stoichiometric composition to achieve a desired characteristic
the process in which a crystalline structure is altered by replacing existing atoms with those atoms from other elements For example, germanium and silicon are base elements used in electronics To give these base elements a more positive or negative quality, bismith or boron atoms can be added, respectively
The addition of an ionic impurity to a semiconductor to alter its conductivity in desired well-defined area and to specified depth
Deliberately adding a very small amount of foreign substance to an otherwise very pure semiconductor crystal These added impurities give the semiconductor an excess of conducting electrons or an excess of conducting holes (the absence of conducting electrons) which is crucial for making a working transistor
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The introduction of an element that alters the conductivity of a semiconductor Adding boron to silicon will create a P-type (more positive) material, while adding phosphorus or arsenic to silicon will create N-type (more negative) material
the intentional alloying of semiconducting materials with controlled concentrations of donor or acceptor impurities